JPH0441178Y2 - - Google Patents
Info
- Publication number
- JPH0441178Y2 JPH0441178Y2 JP12057986U JP12057986U JPH0441178Y2 JP H0441178 Y2 JPH0441178 Y2 JP H0441178Y2 JP 12057986 U JP12057986 U JP 12057986U JP 12057986 U JP12057986 U JP 12057986U JP H0441178 Y2 JPH0441178 Y2 JP H0441178Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- diameter
- support
- cylindrical electrode
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12057986U JPH0441178Y2 (en]) | 1986-08-06 | 1986-08-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12057986U JPH0441178Y2 (en]) | 1986-08-06 | 1986-08-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6327470U JPS6327470U (en]) | 1988-02-23 |
JPH0441178Y2 true JPH0441178Y2 (en]) | 1992-09-28 |
Family
ID=31009024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12057986U Expired JPH0441178Y2 (en]) | 1986-08-06 | 1986-08-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0441178Y2 (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2682221B2 (ja) * | 1990-09-20 | 1997-11-26 | 株式会社村田製作所 | ディスクリミネータ |
-
1986
- 1986-08-06 JP JP12057986U patent/JPH0441178Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6327470U (en]) | 1988-02-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5443645A (en) | Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure | |
US4438188A (en) | Method for producing photosensitive film for electrophotography | |
JP2582553B2 (ja) | プラズマcvd法による機能性堆積膜形成装置 | |
JPS6248753B2 (en]) | ||
US5582648A (en) | Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition | |
JPS60155676A (ja) | プラズマcvd装置 | |
JPH0441178Y2 (en]) | ||
US5338580A (en) | Method of preparation of functional deposited film by microwave plasma chemical vapor deposition | |
US4418645A (en) | Glow discharge apparatus with squirrel cage electrode | |
JPS5931977B2 (ja) | プラズマcvd装置 | |
JPS624872A (ja) | 成膜装置 | |
JP3034139B2 (ja) | アモルファスシリコン感光体及び薄膜形成装置 | |
JPH0364466A (ja) | アモルファスシリコン系半導体膜の製法 | |
KR100269930B1 (ko) | 플라즈마 처리장치 및 플라즈마 처리방법 | |
JPH0438449B2 (en]) | ||
JP3259453B2 (ja) | プラズマcvd装置に用いる電極及びプラズマcvd装置 | |
JPH057462B2 (en]) | ||
JP3673568B2 (ja) | 堆積膜形成装置及びこれを用いた堆積膜形成方法 | |
JPS60215767A (ja) | グロ−放電分解装置 | |
JPS58118111A (ja) | プラズマcvd装置 | |
JP2958850B2 (ja) | プラズマcvd装置およびそれを用いるアモルファスシリコン感光体の製造方法 | |
JP2994658B2 (ja) | マイクロ波cvd法による堆積膜形成装置及び堆積膜形成方法 | |
JPS5990628A (ja) | プラズマcvd装置 | |
JPS62250176A (ja) | 電子写真感光体の製造装置 | |
JPS62276557A (ja) | 電子写真感光体の製造装置 |