JPH0441178Y2 - - Google Patents

Info

Publication number
JPH0441178Y2
JPH0441178Y2 JP12057986U JP12057986U JPH0441178Y2 JP H0441178 Y2 JPH0441178 Y2 JP H0441178Y2 JP 12057986 U JP12057986 U JP 12057986U JP 12057986 U JP12057986 U JP 12057986U JP H0441178 Y2 JPH0441178 Y2 JP H0441178Y2
Authority
JP
Japan
Prior art keywords
plasma
diameter
support
cylindrical electrode
cylindrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12057986U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6327470U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12057986U priority Critical patent/JPH0441178Y2/ja
Publication of JPS6327470U publication Critical patent/JPS6327470U/ja
Application granted granted Critical
Publication of JPH0441178Y2 publication Critical patent/JPH0441178Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP12057986U 1986-08-06 1986-08-06 Expired JPH0441178Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12057986U JPH0441178Y2 (en]) 1986-08-06 1986-08-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12057986U JPH0441178Y2 (en]) 1986-08-06 1986-08-06

Publications (2)

Publication Number Publication Date
JPS6327470U JPS6327470U (en]) 1988-02-23
JPH0441178Y2 true JPH0441178Y2 (en]) 1992-09-28

Family

ID=31009024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12057986U Expired JPH0441178Y2 (en]) 1986-08-06 1986-08-06

Country Status (1)

Country Link
JP (1) JPH0441178Y2 (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2682221B2 (ja) * 1990-09-20 1997-11-26 株式会社村田製作所 ディスクリミネータ

Also Published As

Publication number Publication date
JPS6327470U (en]) 1988-02-23

Similar Documents

Publication Publication Date Title
US5443645A (en) Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure
US4438188A (en) Method for producing photosensitive film for electrophotography
JP2582553B2 (ja) プラズマcvd法による機能性堆積膜形成装置
JPS6248753B2 (en])
US5582648A (en) Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition
JPS60155676A (ja) プラズマcvd装置
JPH0441178Y2 (en])
US5338580A (en) Method of preparation of functional deposited film by microwave plasma chemical vapor deposition
US4418645A (en) Glow discharge apparatus with squirrel cage electrode
JPS5931977B2 (ja) プラズマcvd装置
JPS624872A (ja) 成膜装置
JP3034139B2 (ja) アモルファスシリコン感光体及び薄膜形成装置
JPH0364466A (ja) アモルファスシリコン系半導体膜の製法
KR100269930B1 (ko) 플라즈마 처리장치 및 플라즈마 처리방법
JPH0438449B2 (en])
JP3259453B2 (ja) プラズマcvd装置に用いる電極及びプラズマcvd装置
JPH057462B2 (en])
JP3673568B2 (ja) 堆積膜形成装置及びこれを用いた堆積膜形成方法
JPS60215767A (ja) グロ−放電分解装置
JPS58118111A (ja) プラズマcvd装置
JP2958850B2 (ja) プラズマcvd装置およびそれを用いるアモルファスシリコン感光体の製造方法
JP2994658B2 (ja) マイクロ波cvd法による堆積膜形成装置及び堆積膜形成方法
JPS5990628A (ja) プラズマcvd装置
JPS62250176A (ja) 電子写真感光体の製造装置
JPS62276557A (ja) 電子写真感光体の製造装置